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doi:10.1016/j.sna.2006.04.025
www-mech.eng.cam.ac.uk/profiles/fleck/papers/236.pdf24 Nov 2006: op of the Cu layer. A 140 nm thick HfO2 was then deposited byputtering. ... Finally the. op electrodes were released by removing the unwanted seedayer, and then the a-Si sacrificial layer was etched using SF6lasma. -
1 faimtvqfcpstnsccaocgcn sa�mvMsopSi tm J C. B. W. Pedersene-mail: ...
www-mech.eng.cam.ac.uk/profiles/fleck/papers/206.pdf29 Sep 2006: This raises thefollowing question: how sensitive is the behavior of the size op-timized beam model to the conversion scheme adopted?
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