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www-g.eng.cam.ac.uk/impee/topics/water/files/Water%20use%20for%20agricultural%20and%20manufacturing.xls20 Feb 2006: 40. 200. Data source: Open University (1995) “S268: Physical Resources and Environment” Block 3, pp6. -
JOURNAL OF APPLIED PHYSICS VOLUME 85, NUMBER 10 15 ...
www-g.eng.cam.ac.uk/nms/publications/pdf/Ferrari_JAP1999.pdf12 Dec 2006: bonding found during deposition itself, of about 200 C53. This implies that the relaxation process during and adeposition have significant differences. -
b01330.dvi
www-g.eng.cam.ac.uk/nms/publications/pdf/Bonelli_EJPB2002.pdf12 Dec 2006: 272 The European Physical Journal B. 500 1000 1500 20000. 200. ... eV for fluences of 7,30 and 200 J/cm2 at a pressure of 5 103 Pa. -
doi:10.1016/j.surfcoat.2003.10.146
www-g.eng.cam.ac.uk/nms/publications/pdf/Ferrari_SCT2004.pdf27 Nov 2006: Nano-. 200 A.C. Ferrari / Surface and Coatings Technology 180 – 181 (2004) 190–206. ... w90x. This is again important since the process temper-ature for hard disk deposition is;200 8C. -
doi:10.1016/j.diamond.2004.12.028
www-g.eng.cam.ac.uk/nms/publications/pdf/Piazza_DRM2005.pdf22 Nov 2006: It reaches 200 eV at 1.39104mbar. The trend observed in Ar plasma is expected to be. ... Tencor Alpha-step 200 profilometer. A series of six. measurements along two perpendicular directions in the. -
JOURNAL OF APPLIED PHYSICS VOLUME 90, NUMBER 10 15 ...
www-g.eng.cam.ac.uk/nms/publications/pdf/Racine_JAP2001.pdf4 Dec 2006: of about 200 GPa.34 Thishardness is somewhat too low to confer wear protect. ... For this ana-C:Hlayer was deposited by a PECVD system at 200 W andmTorr pressure. -
Recycling of plastics
www-g.eng.cam.ac.uk/impee/topics/RecyclePlastics/files/Recycling%20Plastic%20v3%20PDF.pdf15 Jun 2006: 200,000 tonnes of plastic rubbish is being sent 8,000 miles to China each year for recycling. ... MJ/kg] 14 80 84 200 23Energy/Volume. [MJ/litre] 8.2 3.2 5.4 9.0 2.4. -
PII: S0925-9635(99)00271-X
www-g.eng.cam.ac.uk/nms/publications/pdf/Conway_DRM2000.pdf6 Dec 2006: of effusion of hydrocarbon species than in ta-C:H (meth).sure of 104 mbar, flow rates of 2.5 and 5 sccm, andaverage ion energies of 130 and 200 eV -
doi:10.1016/j.msec.2003.09.084
www-g.eng.cam.ac.uk/nms/publications/pdf/Piscanec_MSEC2003.pdf28 Nov 2006: 0. 200. 400. 600. 800. 1000. 480 490 500 510 520 530 540. ... 0. 200. 400. 600. 800. A. Inte. nsity (. co. un. -
No Job Name
www-g.eng.cam.ac.uk/nms/publications/pdf/Cantoro_NL2006.pdf13 Nov 2006: We use polished, 0.01-0.02 cm boron-doped Si(100)wafers as substrates, covered with thermally grown SiO2(50-200 nm). ... The process temperature is indicatedfor each sample. Scale bars: 100 (b-d), 500 (e), and 200 nm (f).
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